Method for fabricating a schottky junction
AssigneeSumitomo Electric Industries, Ltd.
InventorsYoshiki Nishibayashi, Hiromu Shiomi, Naoji Fujimori
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Abstract
The characteristics of a Schottky junction between diamond and metal causes the diode using the Schottky junction to have a large leakage reverse current and n-value far bigger than 1. A surface of diamond on which a Schottky junction shall be formed is pretreated by oxygen plasma or halogen plasma. The oxygen plasma or hydrogen plasma improves the surface state of the diamond by decoupling the surface C--C bonds and endowing the resulting extra bonds with hydrogen atoms, normalizing the superlattice structure at the surface. Pretreatment of the diamond by the oxygen or halogen plasma improves the diode properties; decreasing reverse current, increasing forward current and decreasing the n-value nearer to 1.
Claims15
A method for fabricating a Schottky junction comprising diamond and a metal layer deposited directly on the diamond, the method comprising the steps of:
- producing a halogen plasma by exciting a gas comprising one of CCl.sub.4 and HCl;
- pretreating a surface of the diamond with the halogen plasma to change an original superlattice structure of the surface of the diamond to a normal lattice structure, the original superlattice structure having a first periodicity twice as long as a second periodicity of the normal lattice structure;
- and
- depositing the metal layer directly on the pretreated surface of the diamond to form the Schottky junction.
A method for fabricating a Schottky junction comprising diamond and a metal layer deposited directly on the diamond, the method comprising the steps of:
- producing a halogen plasma by exciting a gas comprising HF;
- pretreating a surface of the diamond with the halogen plasma to change an original superlattice structure of the surface of the diamond to a normal lattice structure, the original superlattice structure having a first periodicity twice as long as a second periodicity of the normal lattice structure;
- and
- depositing the metal layer directly on the pretreated surface of the diamond to form the Schottky junction.
A method for fabricating a Schottky junction comprising diamond and a metal layer deposited directly on the diamond, the method comprising the steps of:
- producing a halogen plasma by exciting a gas comprising H.sub.2 and HCl;
- pretreating a surface of the diamond with the halogen plasma to change an original superlattice structure of the surface of the diamond to a normal lattice structure, the original superlattice structure having a first periodicity twice as long as a second periodicity of the normal lattice structure;
- and
- depositing the metal layer directly on the pretreated surface of the diamond to form the Schottky junction.
A method for fabricating a Schottky junction comprising diamond and a metal layer deposited directly on the diamond, the method comprising the steps of:
- producing a halogen plasma by exciting a gas comprising H.sub.2 and CF.sub.4 ;
- pretreating a surface of the diamond with the halogen plasma to change an original superlattice structure of the surface of the diamond to a normal lattice structure, the original superlattice structure having a first periodicity twice as long as a second periodicity of the normal lattice structure;
- and
- depositing the metal layer directly on the pretreated surface of the diamond to form the Schottky junction.
A method for fabricating a Schottky junction comprising diamond and a metal layer deposited directly on the diamond, the method comprising the steps of:
- producing an oxygen plasma by exciting a gas comprising H.sub.2 and O.sub.2 ;
- pretreating a surface of the diamond with the halogen plasma to change an original superlattice structure of the surface of the diamond to a normal lattice structure, the original superlattice structure having a first periodicity twice as long as a second periodicity of the normal lattice structure;
- and
- depositing the metal layer directly on the pretreated surface of the diamond to form the Schottky junction.
A method for fabricating a Schottky junction comprising the steps of:
- producing a plasma by exciting a mixture of gas consisting of H.sub.2 and O.sub.2, 0.1 to 10 percent of a volume of the mixture of gas being O.sub.2 ;
- pretreating a surface of diamond with the plasma to change an original superlattice structure of the surface of the diamond to a normal lattice structure;
- and
- depositing Schottky electrodes directly on the pretreated surface of the diamond.
A method for fabricating a Schottky junction comprising diamond and a metal layer deposited directly on the diamond, the method comprising the steps of:
- producing an oxygen plasma by exciting a gas comprising H.sub.2 O and CO.sub.2 ;
- pretreating a surface of the diamond with the halogen plasma to change an original superlattice structure of the surface of the diamond to a normal lattice structure, the original superlattice structure having a first periodicity twice as long as a second periodicity of the normal lattice structure;
- and
- depositing the metal layer directly on the pretreated surface of the diamond to form the Schottky junction.
A method for fabricating a Schottky junction comprising diamond and a metal layer deposited directly on the diamond, the method comprising the steps of:
- producing one of a halogen plasma and an oxygen plasma;
- pretreating a surface of the diamond with the one of said halogen plasma and said oxygen plasma to change an original superlattice structure of the surface of the diamond to a normal lattice structure, the original superlattice structure having a first periodicity twice as long as a second periodicity of the normal lattice structure;
- and
- depositing the metal layer directly on the pretreated surface of the diamond to form the Schottky junction.
Dependencies are inferred from the claim text.