Efficient narrow spectral width soft-X-ray discharge sources
AssigneeUniversity of Central Florida
InventorWilliam T. Silfvast
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Abstract
Methods for making pulsed and continuous discharge plasma light sources for extreme ultraviolet(EUV) projection lithography and soft-x-ray microscopy as well as other applications are disclosed. A first light source of doubly ionized lithium ions emits over a narrow bandwidth of approximately 13.5 nm. A second light source of beryllium ions radiates at approximately 7.60 nm. A third light source of boron ions radiates at approximately 4.86 nm, and a fourth light source of carbon ions radiates at approximately 3.38 nm. Preferred embodiments of apparatus for generating pulsed and continuous discharge sources are disclosed.
Claims16
A method of radiating a Lithium ion plasma source at approximately 13.5 nm comprising the steps of:
- forming a plasma source substantially composed of Li.sup.2+ ions;
- and radiating the plasma source at approximately 13.5 nm.
A method of radiating a carbon ion plasma source at approximately 3.38 to 3.6 nm, comprising the steps of:
- a plasma source composed of predominantly C.sup.5+ ions;
- and
- radiating the plasma source at approximately 3.38 to 3.6 nm.
A method of radiating a beryllium ion plasma source at approximately 7.6 nm, comprising the steps of:
- forming a plasma source composed of predominantly Be.sup.3+ ions;
- and
- radiating the plasma source at approximately 7.6 nm.
A method of radiating a boron ion plasma source at approximately 4.86 nm comprising the steps of:
- forming a plasma source composed of predominantly B.sup.4+ ions;
- and
- radiating the plasma source at approximately 4.86 nm.
A pulsed discharge source comprising:
- lithium;
- an anode;
- and
- an insulator for supporting the lithium, wherein a pulsed lithium plasma is generated between the anode and the insulator.
A continuous plasma discharge source comprising:
- lithium;
- an anode;
- a cathode;
- and
- an insulator having a silicon carbide bore, wherein a continuous plasma is generated in a region between the anode and the cathode.
Dependencies are inferred from the claim text.