Semiconductor laser and a method for fabricating the same
AssigneeMatsushita Electric Industrial Co., Ltd.
InventorsYasuhito Takahashi, Ayumu Tsujimura
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AssigneeMatsushita Electric Industrial Co., Ltd.
InventorsYasuhito Takahashi, Ayumu Tsujimura
Estimating the term…
An n-ZnMgSSe lower cladding layer, an n-ZnSSe light guiding layer, an undopad CdZnSe active layer, a p-ZnSSe light guiding layer, a p-ZnMgSSe upper cladding layer, and a p-ZnSe cap layer are successively formed on an n-GaAs substrate. Then, grooves and a ridge are formed in the respective p-type layers by etching. A current blocking layer formed by laminating SiO.sub.2 layers and TiO.sub.2 layers in multiple layers is formed so as to bury the grooves. On the top surface of the ridge where the current blocking layer is not formed, an upper electrode is formed. On the bottom surface of the n-GaAs substrate, a lower electrode is formed, and thus the ridge type semiconductor laser is fabricated. This semiconductor laser is capable of emitting blue light with an oscillating wavelength of around 500 nm. The current blocking layer of the lamination of the SiO.sub.2 and TiO.sub.2 layers allows effective confinement of both light and carriers and a drastic decrease in the threshold current for a laser oscillation.
A II-VI compound semiconductor laser, comprising:
A method for fabricating a II-VI compound semiconductor laser, comprising the steps of:
Dependencies are inferred from the claim text.