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US 5,499,076 AGranted
Exposure method and apparatus
AssigneeCanon Kabushiki Kaisha
InventorMasato Muraki
Life of this patent
Estimating the term…
Abstract
Disclosed is an exposure method and apparatus for exposing a substrate by use of a pattern having a phase shift device, wherein the amount of phase shift with the phase shift device can be changed by changing the humidity of an ambient gas of the pattern.
Claims4
A projection exposure apparatus for projecting a pattern of a reticle using phase shift means onto a substrate, said apparatus comprising:
- an optical system for projecting the pattern of the reticle onto the substrate;
- control means for adjusting a refractive index of the phase shift means to control the quantity of phase shift provided by the phase shift means.
A device manufacturing method which includes projecting a pattern of a reticle onto a substrate, said method comprising the steps of:
- providing the reticle with phase shift means;
- and
- adjusting a refractive index of the phase shift means of the reticle to provide a desired quantity of phase shift by the phase shift means.
Dependencies are inferred from the claim text.