Polymer core optical wave-guide and fabrication method thereof
AssigneeHitachi Cable, Ltd.
InventorKatsuyuki Imoto
Life of this patent
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Abstract
A polymer core optical wave-guide which comprises a substrate, a buffer layer formed on the surface of the substrate made of a SiO.sub.x N.sub.y H.sub.z film of desirable thickness having a refractive index of n.sub.b, an approximately rectangle-shaped core formed on the buffer layer made of a polymer material having a refractive index of n.sub.w (n.sub.w >n.sub.b), a cladding layer covering the surface of the core having a refractive index of n.sub.c (n.sub.c <n.sub.w).
Claims16
A polymer core optical wave-guide which comprises a substrate, a buffer layer formed on the surface of the substrate made of a SiO.sub.x N.sub.y H.sub.z film wherein 0.72=x<1;
- 0<y.ltoreq.0.25;
- 0<z.ltoreq.0.03, of desirable thickness having a refractive index of n.sub.b, an approximately rectangle-shaped core formed on the buffer layer made of a polymer material having a refractive index of n.sub.w (n.sub.w >n.sub.b), a cladding layer covering the surfaces of the buffer layer and the core having a refractive index of n.sub.c (n.sub.c <n.sub.w).
A fabrication method of polymer core optical wave-guide, comprising the steps of:
- forming layers on the surface of a substrate in the order of a buffer layer of SiO.sub.x N.sub.y H.sub.z film, wherein (0.72.ltoreq.x<1;
- 0<y.ltoreq.0.25;
- 0<z.ltoreq.0.03) a core layer of polymer material, a mask layer of SiO.sub.x N.sub.y H.sub.z film, wherein (0.72.ltoreq.x<1;
- 0<y.ltoreq.0.25;
- 0<z.ltoreq.0.03),
- forming a photoresist pattern on the mask layer of SiO.sub.x N.sub.y H.sub.z film through photo-lithography,
- patterning the mask layer of SiO.sub.x N.sub.y H.sub.z film using the photoresist pattern as a mask through dry etching,
- etching the polymer layer using the SiO.sub.x N.sub.y H.sub.z mask pattern as a mask through dry etching, and
- covering the surface of the dry etched polymer core with a cladding layer.
A fabrication method of polymer core optical wave-guide comprising the steps of:
- forming an indented shaped portion on the surface of a substrate,
- forming a buffer layer of SiO.sub.x N.sub.y H.sub.z film, wherein (0.72.ltoreq.x<1;
- 0<y.ltoreq.0.25;
- 0<z.ltoreq.0.03) on the substrate,
- forming a core layer of polymer material in the indented portion corresponding to the indented portion of the buffer layer,
- forming a mask layer of SiO.sub.x N.sub.y H.sub.z film, wherein (0.72.ltoreq.x<1;
- 0<y.ltoreq.0.25;
- 0<z.ltoreq.0.03), on the buffer layer and the surface of the core, the mask layer of SiO.sub.x N.sub.y H.sub.z film serving as a part of a cladding layer,
- forming a photoresist pattern on the mask layer of SiO.sub.x N.sub.y H.sub. film through photo-lithography,
- patterning the mask layer of SiO.sub.x N.sub.y H.sub.z film using the photoresist pattern as a mask through dry etching,
- etching the polymer layer using the SiO.sub.x N.sub.y H.sub.z mask pattern as a mask through dry etching, and
- covering the surface of the dry etched polymer core with a cladding layer.
Dependencies are inferred from the claim text.