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US 5,496,943 AGranted
Heterocyclic compounds and their production
AssigneeNippon Paint Co., Ltd.
InventorsOtohiko Tsuge, Taizo Hatta, Satoshi Urano, Noriyuki Tsuboniwa, Ryuzo Mizuguchi
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Abstract
Disclosed is a novel heterocyclic compound selected from the group consisting of the compounds [IV] to [VII], [IX] and [X]. The heterocyclic compound is useful for reactive materials in chemical industry. A process for producing the heterocyclic compound is also disclosed.
Claims5
A heterocyclic compound selected from the group consisting of the compounds IV to VII wherein the compounds IV to VII are represented by the formulas:
- ##STR52## wherein R is a lower alkyl group;
- R.sup.1 is an alkyl having 1 to 6 atoms, an aryl group having 6 to 10 carbon atoms, an aralkyl group having 7 to 8 carbon atoms, an alkenyl having 2 or 3 carbon atoms or an alkynyl having 2 or 3 carbon atoms;
- each R.sup.2 is the same or different and respectively indicates --H, --R.sup.1, or --OR.sup.1, --CONR.sub.2.sup.1, --CONHR.sup.1, --CHO, --COR.sup.1, --CO.sub.2 R.sup.1, --NO.sub.2 or halogen atom, or R.sup.1 and R.sup.2 may not bond together;
- X is ##STR53## --O--, --S--, or ##STR54## two substituents --R.sup.1 on N atom is the same or different when X is ##STR55## and they may bond together with O to form a six-membered ring with the oxygen in the 4 position to the ring N;
- and the above substituents R.sup.1 and R.sup.2 may be substituted with a substituent selected from the group consisting of an alkyl, alkenyl, aralkyl, alkynyl, aryl, cycloalkyl, alkoxy, halogen, acyl, ester, nitro, cyano, sulfide, sulfone, tertiary amino, and silicon, ##STR56## wherein R, R.sup.1, R.sup.2 and X are as defined above, ##STR57## wherein R, R.sup.1, R.sup.2 and X are as defined above, ##STR58## wherein R, and R.sup.2 are as defined above.
2 more elements
A process for producing a heterocyclic compound selected from the group consisting of the compounds IV to VII represented by the following formulas:
- ##STR59## wherein R, R.sup.1, R.sup.2 and X are as defined below, ##STR60## wherein R, R.sup.1, R.sup.2 and X are as defined below, ##STR61## wherein R, R.sup.1, R.sup.2 and X are as defined below, ##STR62## wherein R and R.sup.2 are as defined below, wherein R is a lower alkyl group, R.sup.1 is an alkyl group having 1 to 6 carbon atoms, an aryl group having 6 to 10 carbon atoms, an aralkyl group having 7 to 8 carbon atoms, an alkenyl having 2 or 3 carbon atoms or alkynyl group having 2 or 3 carbon atoms;
- each R.sup.2 is the same or different and respectively indicates --H, --R.sup.1, or --OR.sup.1, --CONR.sub.2.sup.1, --CONHR.sup.1, --CHO, --COR.sup.1, --CO.sub.2 R.sup.1, --NO.sub.2 or halogen atom, or R.sup.1 and R.sup.2 may bond together to form a cyclic group;
- X is ##STR63## --O--, --S--, or ##STR64## two substituents --R.sup.1 on N atom is the same or different when X is ##STR65## and they may bond together with or without O atom to form a cyclic group;
- and the above substituents R.sup.1 and R.sup.2 may be substituted,
- which process comprises reacting a compound represented by the formula:
- ##STR66## with a compound represented by the formula:
- A.dbd.B II
- wherein A.dbd.B is a compound selected from the group consisting of vinyl ethers, enamines, vinyl thioethers, alkoxyalkynes, thioalkoxyalkynes, ynnamines, N-substituted maleimides, maleic anhydride, maleic acid and esters thereof, fumaric acid and esters thereof, acetylenemonocarboxylic acids and esters thereof, acetylenedicarboxylic acids and esters thereof, phenylacetylenes, acylated acetylenes, (moth)acrylic acid and esters thereof, (meth)acrylonitrile, quinones, cyanoethylenes, isocyanates, ketenes, ketenimines, carbodiimides, thioketenes, sulfinylimines, ketones, isocyanides, carbenes, allenes, isothiocyanates, sulfines, carbon bisulfide, sulfondiimides, azomethine compounds, nitriles, oxiranes, nitrons, nitrile oxides, thiiranes and azirines, and A.dbd.B may be substituted or have a cyclic structure.
5 more elements
Dependencies are inferred from the claim text.