Hydrogen fluoride dopant source in the preparation of conductive coated substrate
AssigneeAmoco/Enron Solar
InventorsKai W. Jansen, Benjamin F. Fieselmann
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Abstract
The present invention relates to the production of hydrogen fluoride dopant source gases for use in the production of conductive coatings on a substrate. More specifically, a fluorocarbon source gas is decomposed in the presence of oxygen to yield HF which is passed to a deposition furnace wherein a fluoride doped metal oxide coated glass substrate is prepared.
Claims10
A process for the preparation of a substrate having a fluoride doped conductive coating thereon comprising:
- producing an HF dopant feed gas by heating a fluorocarbon in the presence of a source of oxygen to a temperature sufficient to decompose said fluorocarbon;
- introducing said HF dopant feed gas into a conductive coating source gas;
- and
- depositing the coating from said HF dopant feed gas and said source gas on said substrate.
A process for the preparation of a coated conductive substrate comprising:
- producing an HF dopant feed gas by heating a fluorocarbon in the presence of a source of oxygen to a temperature sufficient to decompose said fluorocarbon and form the HF;
- introducing said HF dopant feed gas and a source gas for producing a conductive coating to a deposition furnace containing said substrate;
- and depositing a fluoride doped conductive coating on said substrate.
A process for the preparation of tin oxide coated conductive glass comprising:
- producing an HF dopant feed gas by heating a fluorocarbon in the presence of air to a temperature sufficient to decompose said fluorocarbon to form the HF;
- introducing said HF dopant feed gas and a tin source gas to a deposition furnace containing a glass substrate;
- and
- depositing a fluoride doped tin oxide coating on said glass substrate.
Dependencies are inferred from the claim text.