Electron beam radiator with cold cathode integral with focusing grid member and process of fabrication thereof

A process of fabricating an electron beam radiator comprising the steps of:

• a) preparing a first laminated sub-structure and a second laminated sub-structure,
• said first laminated sub-structure comprising a semiconductor substrate, a first insulating layer formed on a major surface of the semiconductor substrate and having a plurality of first apertures exposing central sub-areas of a central area on said major surface, a plurality of emitter electrodes respectively formed on said central sub-areas and accommodated in said first apertures, and a gate electrode formed on said first insulating layer and having a plurality of second apertures exposing said plurality of emitter electrodes,
• said second laminated sub-structure comprising a second insulating layer formed having a third aperture larger in area than said central area, and a grid electrode formed on said second insulating layer and having a fourth aperture larger in area than said central area;
• b) aligning said first laminated sub-structure with said second laminated sub-structure by means of an optical aligning system in such a manner that said central area is positioned inside of said third and fourth apertures;
• and
• c) fixing said first laminated sub-structure to said second laminated sub-structure.