Photosensitization of optical fiber and silica waveguides
AssigneeHer Majesty the Queen in right of Canada, as represented by the Minister of Communications
InventorsFrancois C. Bilodeau, Bernard Y. Malo, Jacques Albert, Derwyn C. Johnson, Kenneth O. Hill
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Abstract
A method of fabricating a strongly photosensitive optical waveguide is comprised of locally heating at least a portion of a weakly photosensitive optical waveguide for a period of time sufficient to increase the density of defects associated with photosensitivity in the heated portion of the waveguide core.
Claims29
A method of fabricating a strongly photosensitive optical waveguide comprising locally heating while maintaining the structural integrity of a portion of a weakly photosensitive optical waveguide to an approximately white hot temperature for a period of time sufficient to increase the concentration of defects associated with photosensitivity in the heated portion of said waveguide.
A method of fabricating a strongly photosensitive waveguide comprising heating a weakly photosensitive optical waveguide to an approximately white hot temperature in a high pressure plasma of hydrogen or deuterium gas for a period of time sufficient to increase the concentration of defects associated with photosensitivity in the heated waveguide.
A method of photosensitization comprising locally heating while maintaining the structural integrity of at least a portion of a weakly photosensitive silica optical waveguide doped with phosphorous to an approximately white hot temperature for a period of time sufficient to increase the concentration of defects associated with photosensitivity in the heated portion of the waveguide and irradiating said heated portion with actinic radiation in order to cause a refractive index change in the waveguide.
Dependencies are inferred from the claim text.