A method of measuring a barrier height distribution in an insulated gate field effect transistor having drain, gate and source electrodes formed on drain, gate and source regions of the transistor, respectively, and a back gate electrode formed on a surface of a semiconductor substrate opposite the gate region, the gate electrode being at least partially transparent, the method comprising the steps of:
- electrically connecting the source and drain electrodes to one another;
- applying a gate bias to the gate electrode;
- generating a plurality of electrons in the semiconductor substrate;
- applying a varying back gate bias to the back gate electrode while the plurality of electrons are generated, and measuring the current conducted by the gate electrode and the current conducted by the connected source and drain electrodes;
- and
- obtaining an inverse Laplace transform of a ratio of the measured current conducted by the gate electrode and the measured current conducted by the source and drain electrodes, to thereby determine the barrier height distribution in the transistor.