Deposition apparatus and method
AssigneeElectrotech Equipments Limited
InventorsChristopher Dobson, Adrian Kiermasz, Knut Beekmann, Christine Shearer, Edmond Ling, Alan Winn, Rob Wilby
Life of this patent
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Abstract
A reactor 10 defines a chamber 11 in which are disposed an upper electrode 12 and a lower workpiece electrode 13. The upper electrode is connected to a R.F. supply whilst the lower electrode is connected to a stress control unit 14. The stress control unit is used to adjust or maintain the effective resistance of the connection between the workpiece electrode 13 and ground.
Claims7
A reactor apparatus comprising a chamber, means for forming a plasma within the chamber, an electrode for supporting the workpiece, means for allowing gas to be introduced into the chamber such that a film can be deposited on the workpiece, means for connecting the electrode to ground and including adjustable means for varying the effective resistance of the connections between the electrode and ground.
A method of controlling the stress in a film deposited on a workpiece comprising placing the workpiece on an electrode in a reactor chamber, introducing a gas into the chamber, connecting the workpiece electrode to ground via a variable effective resistance means and selecting the resistance of the variable effective resistance means in accordance with the desired stress characteristics.
Apparatus for controlling the stress in a film deposited on an electrode comprising a reactor chamber, means for striking a plasma in the chamber, an electrode for supporting the workpiece in the chamber and means for varying the magnitude of the negative sheath associated with the electrode in the presence of the plasma to alter the film stress.
Dependencies are inferred from the claim text.