Fluorine doped silicon oxide process

A fluorine-containing silicon oxide film supported on a substrate comprising SiO.sub.p F.sub.q, wherein p=2-q and q=0.03-0.6, produced by plasma-enhanced chemical vapor deposition using a fluorinated silicon source of the formula:

• ##STR10## wherein at least one of R.sup.1 -R.sup.6 is fluorine and the remaining R groups are independently H, F, non-fluorinated-, partially fluorinated- or perfluorinated-:
• alkyl, alkenyl, alkynyl aryl or benzylic groups, or C.sub.x H.sub.2x when one or more of R.sup.1, R.sup.2 or R.sup.3 is connected to R.sup.4, R.sup.5 or R.sup.6 through a bridging group C.sub.y H.sub.2y ;
• where x is 1-6, and y is 0-6;
• where M is Si or C and n is 0-6;
• and R.sup.7 is independently H, F, C.sub.z H.sub.2z+1 where z is 1-6 or C.sub.r H.sub.s F.sub.t where r is 1-6, s is (2r+1-t);
• t is 1 to (2r+1).

A process for forming a fluorine-containing silicon oxide film on a substrate by plasma-enhanced chemical vapor deposition using a fluorinated silicon source, comprising the steps of:

• (a) establishing a plasma by appropriate conditions in a chemical vapor deposition reactor charged with a substrate to be coated;
• (b) introducing a fluorinated silicon source and an oxygen containing compound into the reactor;
• (c) reacting said fluorinated silicon source with said oxygen containing compound to produce a chemical vapor deposited fluorinated silicon oxide film on said substrate, wherein said fluorinated silicon source has the formula:
• ##STR11## wherein at least one of R.sup.1 -R.sup.6 is fluorine and the remaining R groups are independently H, F, non-fluorinated-, partially fluorinated-or perfluorinated-:
• alkyl, alkenyl, alkynyl, aryl or benzylic groups, or C.sub.x H.sub.2x when one or more of R.sup.1, R.sup.2 or R.sup.3 is connected to R.sup.4, R.sup.5 or R.sup.6 through a bridging group C.sub.y H.sub.2y ;
• where x is 1-6, and y is 0-6;
• where M is Si or C and n is 0-6;
• and R.sup.7 is independently H, F, C.sub.z H.sub.2z+1 where z is 1-6 or C.sub.r H.sub.s F.sub.t where r is 1-6, s is (2r+1-t);
• t is 1 to (2r+1).