Method of making a micromechanical silicon-on-glass tuning fork gyroscope

A process for forming a micromechanical tuning fork structure adapted for use in rate sensor applications comprising the steps of:

• providing a silicon substrate having a planar first surface;
• forming a height varying pattern in said first surface of said silicon substrate;
• exposing said first surface of said silicon substrate to a silicon dopant for a discrete time period;
• removing selected portions of said silicon substrate;
• providing a second substrate having a planar first surface, said first surface of said second substrate comprised of glass;
• forming a plurality of recesses in said first surface of said second substrate;
• depositing a plurality of superimposed metallic layers in said plurality of recesses;
• removing a first metallic layer to expose a second metallic layer from at least one of said plurality of recesses;
• disposing said first surface of said silicon substrate against said first surface of said second substrate;
• and
• removing a second surface of said silicon substrate not exposed to said silicon dopant.