Method of automatically cleaning a vacuum vapor deposition tank
AssigneeFuji Photo Film Co., Ltd.
InventorJunji Nakada
Life of this patent
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Abstract
When vapor-depositing a magnetic material 6 onto a base 3 in a vacuum vapor deposition tank 1, to clean the residue of evaporated atoms evaporated from the magnetic material 6 adhering undesirably to members 9, 10 constituting the vacuum vapor deposition tank 1, the members 9, 10 are separated and transported to a cleaning position after the completion of the process of vapor deposition onto the base 3, and the members 9, 10 are cleaned by a cleaning robot 21 arranged to be capable of controlling the cleaning direction, water pressure, and the like at the cleaning position. The members 9, 10 are then allowed to wait at the standby position in preparation for an ensuing vapor deposition process, and cleaning water is accommodated in a tank to ensure reutilization.
Claims10
A method of automatically cleaning a vacuum member wherein the member to be cleaned has a magnetic material substance adhered thereto, said member to be cleaned being used in a vacuum vapor deposition tank for vacuum-depositing a magnetic material, said method comprising:
- transporting said member to be cleaned outside said vacuum vapor deposition tank to a cleaning area via a passage;
- cleaning the member to be cleaned with a cleaning fluid which is injected under high pressure in the range of 100 to 5000 kgf/cm.sup.2, inclusive in the cleaning area;
- transferring the member to be cleaned to a drying area and drying the member to be cleaned;
- subsequently returning the member to be cleaned to the vacuum vapor deposition tank through the passage.
Dependencies are inferred from the claim text.