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US 5,491,002 AGranted
Multilayer CVD diamond films
AssigneeGeneral Electric Company
InventorDavid E. Slutz
Life of this patent
Estimating the term…
Abstract
Multilayer CVD diamond films are provided, wherein grain boundaries of the diamond layers are interrupted by renucleating and growing diamond on new nucleation sites comprised of metal. These nucleation sites are positioned on the interface between diamond layers. Methods for producing these multilayer CVD diamond films are also provided wherein the diamond growth on a substrate is interrupted by the deposition of metals which provide new nucleation sites. Diamond growth is then reinitiated.
Claims2
A method for forming a multilayer chemical vapor deposited (CVD) diamond film, consisting essentially of the steps of:
- (1) depositing diamond on a heated substrate by impingement with an excited hydrocarbon-hydrogen gas mixture under conditions of temperature, pressure and gas concentration which promote diamond nucleation and growth on the substrate;
- (2) interrupting the diamond growth of said step (1);
- (3) depositing a metal carbide layer of less than 0.01 microns suitable for nucleating diamond on the diamond formed in said step (1);
- and
- (4) reinitiating said step (1).
2 more elements
Dependencies are inferred from the claim text.