Process and device for the continuous treatment of silicon
AssigneeAnton More
InventorsAnton More, Karl Hutzler, Rudolf Koch
Life of this patent
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Abstract
The invention relates to a process for the continuous treatment of silicon in which a slag in a pivotable low-shaft furnace (1) with a discharge pipe (4) reaching the bottom of the furnace tank is taken to a temperature of 1450.degree. to 1800.degree. C. and this slag is used to melt solid silicon and/or liquid silicon is continuously refined and the liquid refined silicon is then sprayed with compressed air or nitrogen (7) and continuously conveyed into a transport crucible (11) by being poured into a stream of water (9) in the channel (8) via a dewatering filter (10) and thus obtained in granular form. The invention also relates to devices for implementing the process.
Claims12
A process for continuous treatment of silicon comprising the steps of:
- a) providing a tilting low-shaft furnace having a treatment tank therein and a discharge pipe communicating with an interior of said treatment tank;
- b) placing one end of said discharge pipe adjacent a bottom of said treatment tank such that said discharge pipe extends at an angle from the bottom of said treatment tank;
- c) inserting slag into said treatment tank;
- d) heating the slag in said treatment tank to a temperature of about 1450.degree. C. to about 1800.degree. C.;
- e) adding silicon in said treatment tank for at least one of melting said silicon and refining said silicon with said heated slag;
- and
- f) tilting said furnace such that said refined silicon flows through said discharge pipe and is discharged from said furnace.
A process for continuous treatment of silicon comprising the steps of:
- a) providing a tilting low-shaft furnace defining a treatment chamber therein and having a discharge pipe located adjacent and extending at an angle up from a bottom of the treatment chamber;
- b) placing a coiled aluminum wire inside the discharge pipe;
- c) inserting slag into said treatment chamber;
- d) heating the slag in said chamber to a temperature of about 1450.degree. C. to about 1800.degree. C.;
- e) adding silicon in said chamber for refining said silicon with said heated slag;
- and
- f) tilting said furnace such that said refined silicon flows through the discharge pipe and is discharged from said furnace.
An apparatus for continuous treatment of silicon comprising:
- a) a tilting low-shaft furnace having a treatment tank therein and a discharge pipe communicating with an interior of said treatment tank;
- b) one end of said discharge pipe being located adjacent a bottom of said treatment tank such that said discharge pipe extends at an angle from the bottom of said treatment tank;
- c) means for heating slag, added to said treatment tank, to a temperature of about 1450.degree. C. to about 1800.degree. C.;
- d) and means for tilting said furnace such that refined silicon flows through said discharge pipe and is discharged from said furnace;
- whereby when slag is added to said treatment tank and heated in said treatment tank to a temperature of about 1450.degree. C. to about 1800.degree. C. and when silicon is added to said treatment tank, said silicon is at least one of melted and refined by said heated slag and said refined silicon flows through said discharge pipe and is discharged from said furnace.
Dependencies are inferred from the claim text.