Photodefinable polymers containing perfluorocyclobutane groups
AssigneeThe Dow Chemical Company
InventorsDavid A. Babb, W. Frank Richey, Katherine S. Clement, Eric S. Moyer, Marius W. Sorenson
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Abstract
A polymer has at least one photoactive site and more than one perfluorocyclobutane group. New monomers containing photoactive sites or photoactive precursors and at least one perfluorovinyl group are useful for making such polymers. Processes of making such polymers and the monomers from which they are made are disclosed. The polymers are useful in coatings, photoresists, and the like.
Claims47
A method of using a polymer having at least one photoactive site and plural perfluorocyclobutane groups as a coating comprising application of at least one such polymer, which polymer is at least partially soluble or dispersible, to a surface and exposing at least a portion of said polymer to incident photonic radiation sufficient to render the polymer so exposed less soluble or dispersible.
The method of claim 15 wherein photosensitizer compounds are also used with the polymer in a quantity sufficient to increase the effect wavelength of the incident photonic radiation.
A method of using a polymer having at least one photoactive site and more than one perfluorocyclobutane group as a negative photoresistant comprising the steps of (1) applying at least one such polymer, which polymer is at least partially soluble or dispersible in a solvent, to a surface or substrate (2) exposing a portion of said polymer to incident photonic radiation such that the exposed portion of the polymer becomes less soluble or dispersible than a remaining unexposed portion, and (3) removing the unexposed portion.
Dependencies are inferred from the claim text.