Film forming composition
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsMasahiko Minemura, Osamu Uchida
Life of this patent
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Abstract
A film forming composition, comprising an amine-modified highly polymerized polysiloxane represented by the general formula (1): ##STR1## wherein R, which are the same or different, each represent a monovalent hydrocarbon group having 1 to 6 carbon atoms, a hydroxyl group, or a hydrogen atom, R' each represent an amino-group-containing organic group, a is an integer of 0 to 3, m is an integer of 1 or more, and n is an integer of 5 or more, provided that m+n is an integer of 2,000 or more, and dissolved in an organic solvent, which film forming composition can give a smooth soft film that is excellent in water repellency, water resistance, touch, and durability in comparison with the conventional film forming compositions.
Claims11
A film forming composition, comprising an amine-modified highly polymerized polysiloxane represented by the general formula (1):ps ##STR3## wherein R, which are the same or different, each represent a monovalent hydrocarbon group having 1 to 6 carbon atoms, a hydroxyl group, or a hydrogen atom, R' each represent an amino-group-containing organic group, a is an integer of 0 to 3, m is an integer of 1 or more, and n is an integer of 5 or more, provided that m+n is an integer of 2,000 or more, and an organic solvent in which said amine-modified highly polymerized polysiloxane is dissolved.
Dependencies are inferred from the claim text.