Method for manufacturing photodetector using a porous layer
AssigneeNational Science Council
InventorMing-Kwei Lee
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Abstract
The present invention is related to a method for manufacturing a photodetector which comprises steps of: (a) preparing a substrate having a back surface; (b) applying a first metal layer on the back surface; (c) annealing the substrate coated with the first metal layer in an inert gas atmosphere; (d) applying an anti-corrosion layer on the first metal layer; (e) immersing the anti-corrosion layer-applied substrate in a solution; (f) eroding the anti-corrosion layer-applied substrate to obtain a porous layer thereon; and (g) applying a thin film layer of a second metal to an upper surface of the porous layer to obtain the photodetector. The present photodetector has a wider frequency band and a higher sensitivity than conventional ones and the present manufacturing method is simple and economical.
Claims24
A method for manufacturing a photodetector comprising steps of:
- (a) preparing a substrate having a back surface;
- (b) coating a first metal layer on said back surface;
- (c) annealing said substrate coated with said first metal layer in an inert gas atmosphere;
- (d) applying an anti-corrosion layer on said first metal layer;
- (e) immersing said anti-corrosion layer-applied substrate in a solution;
- (f) eroding said anti-corrosion layer-applied substrate to obtain a porous layer therereon;
- and
- (g) applying a thin film layer of a second metal to an upper surface of said porous layer to obtain said photodetector.
Dependencies are inferred from the claim text.