Photographic light-sensitive material applicable for rapid processing
AssigneeAgfa-Gevaert
InventorHubert Vandenabeele
Life of this patent
Estimating the term…
Abstract
A light-sensitive photographic silver halide material is disclosed comprising a support and on one or both sides thereof at least one silver halide emulsion layer, at least one gelatin antistress layer and, optionally, a substantially gelatin free antistatic surface layer coated thereover, characterised in that said emulsion layer(s) comprise(s) at least one synthetic clay. As a result the said material is less sensitive to roller marks in automatic processing machines.
Claims8
A light-sensitive photographic silver halide material comprising a support and on one or both sides thereof at least one silver halide emulsion layer, characterised in that said silver halide emulsion layer(s) comprise(s) at least one synthetic clay.
Dependencies are inferred from the claim text.