Thermal development diazo copying material
AssigneeRicoh Company, Ltd.
InventorsMasanori Rimoto, Shigeru Kusakata
Life of this patent
Estimating the term…
Abstract
A thermal development diazo copying material is composed of a support, and a photosensitive layer formed thereon, which includes a diazo compound, a coupler, an alkali-soluble resin, and a sensitizer, with only the coupler being contained in microcapsules made of the alkali-soluble resin.
Claims18
A thermal development diazo copying material comprising a support, and a photosensitive layer formed thereon, which comprises a diazo compound, a coupler, an alkali-soluble resin comprising a styrene-acrylic acid copolymer, and a sensitizer, with only said coupler being contained in capsules made of said alkali-soluble resin.
A thermal development diazo copying material comprising a support, a layer which comprises a diazo compound and a sensitizer, and a layer which comprises a coupler and an alkali-soluble resin wherein said coupler is contained in capsules made of said alkali-soluble resin.
Dependencies are inferred from the claim text.