Particle analysis method
AssigneeSeiko Instruments Inc.
InventorTadashi Kitamura
Life of this patent
Estimating the term…
Loading patent…
AssigneeSeiko Instruments Inc.
InventorTadashi Kitamura
Estimating the term…
Using a scanning type electron microscope, a spot where a particle is detected is determined by acquiring the evaluation of detection of particles on the surface of a wafer, etc., based on the coordinate information of a particle spot, by particle detection equipment, from the image within the view, shifting the view from the most probable spot of particle existence to less probable spots in sequence, and manipulating evaluation of detection as follows; supposing that the variance of histogram of the image is .sigma., and that the value N is equal to or more than 3, which is empirically known, and assuming that the spots where the data out of the range of .+-.N.sigma. exist is that of particles detected, pixels of particles are counted. In this manipulation, weighting corresponding to the spot of histogram and weighting corresponding to the mean of intensity of detection at the neighborhood of particles are executed.
A particle analysis method for analyzing particles on a sample in a scanning type electron microscope which directs a narrow, focussed electron beam through an electromagnetic lens onto a surface of a sample mounted on a high precision stage in scanning, produces a detection signal representing intensity of secondary electrons or reflected electrons from the sample surface, and displays an image of the sample surface based on the detection signal, said method comprising the steps of:
Dependencies are inferred from the claim text.