Fabrication of moly masks by electroetching
AssigneeInternational Business Machines Corporation
InventorsDenis J. Brophy, Madhav Datta, Derek B. Harris, Matthew T. Kurdziel, Frank S. Ryan
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AssigneeInternational Business Machines Corporation
InventorsDenis J. Brophy, Madhav Datta, Derek B. Harris, Matthew T. Kurdziel, Frank S. Ryan
Estimating the term…
Masks for microelectronics technology are fabricated by electrochemical etching. Molybdenum sheet or foil is masked with patterned photoresist on one side, and a mating, mirror-image pattern of photoresist is applied on the other side of the foil in exact registration with the first pattern. The foil is immersed in electrolyte (an aqueous solution of sodium nitrate, sodium hydroxide, thiourea, and surfactant) along with nickel anode plates held parallel to the foil surfaces 1-3 cm away. The anode plate is made slightly smaller than the mask area of the foil. When voltage is applied across the cell, the foil is etched through to form vias. The electrolyte is pumped across the surface of the foil and uniform flow velocity over the foil surface is achieved.
A method of etching a molybdenum foil having a mask area, the method comprising the steps of:
An apparatus for electroetching molybdenum foil with a liquid electrolyte, the molybdenum foil having two surfaces, the apparatus comprising:
A method of etching a metal foil, the foil having two sides together defining a mask area, the method comprising the steps of:
An apparatus for electroetching a metal foil with a liquid electrolyte, the foil having two surfaces, each surface having a stationary photoresist mask, the apparatus comprising:
A method of etching a metal foil, the foil having a mask area, the method comprising the steps of:
An apparatus for electroetching metal foil with a liquid electrolyte, the foil having two surfaces, the apparatus comprising:
Dependencies are inferred from the claim text.