Apparatus and method for monitoring and controlling an ion implant device
AssigneeAdvanced Micro Devices, Inc.
InventorVan Le
Life of this patent
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AssigneeAdvanced Micro Devices, Inc.
InventorVan Le
Estimating the term…
An improved ion implant device is provided having programmable and graphical user interface. The ion implant device can be accessed by a remote computer such as an IBM.RTM.-compatible PC/XT/AT personal computer to allow an operator to access, control and monitor the implant device from a remote location. Various control signals associated with implant operation can be changed or modified according to implant parameters stored within the computer. Each time a wafer lot is to be processed, the implant parameters can be quickly retrieved from the computer and read to the implant device with minimum operator error. Likewise, various implant parameters and/or implanter settings can be written to the computer and stored within the computer's memory. The computer can be easily interfaced or retrofitted to existing implant devices with only a minimum amount of necessary software code and associated hardware.
An apparatus for monitoring and controlling an ion implant device, comprising:
An apparatus for monitoring and controlling an ion implant device, comprising:
An apparatus for writing control signals from an ion implant device to a computer, comprising:
Dependencies are inferred from the claim text.