Cathode
AssigneeU.S. Philips Corporation
InventorWillem L. C. M. Heijboer
Life of this patent
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Abstract
A low-power cathode can be obtained by arranging it on a substrate (1), preferably of silicon, which is entirely or partly removed at the location of the emissive structure (11) by means of, for example, anisotropic etching. Because of its low power, the cathode is particularly suitable for multi-beam applications.
Claims13
An electron source comprising a substrate having an upper surface and a lower surface, a heating element and an electron emissive material, said substrate having a recess extending from said lower surface towards said upper surface of said substrate and said heating element and said electron emissive material situated above said upper surface situated above said recess.
Dependencies are inferred from the claim text.