Thin film of gallium oxide and method of producing the film
AssigneeCarl-Zeiss-Stiftung
InventorBernhard Ganswein
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Abstract
A thin film of gallium oxidized with oxygen is produced by reactive vapor depositing gallium in a vacuum with oxygen followed by tempering. The refractive index (n) lies in the range of 1.2 to 1.3.
Claims6
A composite comprising a glass or quartz glass substrate upon which is disposed an antireflection film, said film comprising gallium oxidized by oxygen and having an index of refraction in the range of 1.2 to 1.3.
A composite comprising an optical element, said optical element being a body of solid transparent material upon which is disposed a thin film, said thin film comprising gallium oxidized by oxygen and having an index of refraction in the range of 1.2 to 1.3.
A composite comprising a solid transparent material substrate upon which is disposed a thin film, said thin film comprising at least a two layer film-stack, wherein the improvement comprises one of the at least two layers being gallium oxidized by oxygen and having an index of refraction in the range of 1.2 to 1.3.
Dependencies are inferred from the claim text.