Plasma processing apparatus employing a textured focus ring
AssigneeApplied Materials, Inc.
InventorsJoseph Kava, Richard J. McGovern, Greg A. Blackburn
Life of this patent
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Abstract
The invention is directed to a focus ring for surrounding a workpiece/surface substrate during plasma processing comprising a hollow annular assembly comprised of electrically insulating material and having a texturized surface. The texturized ring is preferably in the geometry of a generally cylindrical structure. The texturizing of the ring can be effected by any means of surface abrasion including bead blasting or chemical etching.
Claims12
A method for plasma processing of a semiconductor workpiece comprising:
- a) placing a semiconductor workpiece to be processed on an electrode disposed in a plasma reactor chamber;
- b) surrounding the workpiece with a focus ring comprised of a hollow annular assembly further comprised of insulating material and having a texturized surface;
- c) evacuating said reactor chamber and introducing reactive gas into the chamber;
- and
- d) generating a plasma in the chamber by applying power to the substrate supporting electrode whereby the workpiece is processed by the plasma generated reactive gases and a stable coating of plasma generated particulate material is formed on the texturized surface of the focus ring.
A semiconductor plasma processing apparatus for processing workpieces comprising:
- a) a semiconductor processing chamber having a reactive gas inlet and a reactive gas outlet;
- b) an electrode disposed in the processing chamber for supporting a semiconductor workpiece;
- c) power supply connected to the substrate supporting electrode;
- and
- d) a focus ring for surrounding the workpiece comprising a hollow annular assembly comprised of insulating material and having a texturized surface to enhance the stability of plasma generated residual coatings formed on said surface.
A focus ring for surrounding a semiconductor workpiece in a plasma processing apparatus comprising a hollow annular assembly of a substantially cylindrical structure comprised of insulating material and having a texturized surface in the form of a micropatterned line configuration to enhance the stability of plasma generated residual coatings formed on said surface.
Dependencies are inferred from the claim text.