Processing method and apparatus thereof
AssigneeTokyo Electron Limited
InventorsHayashi Otsuki, Yoichi Deguchi
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AssigneeTokyo Electron Limited
InventorsHayashi Otsuki, Yoichi Deguchi
Estimating the term…
The present invention relates to a processing chamber that processes an object to be processed in an atmosphere of a processing gas. The processing chamber is provided with a mounting stand having a holder mechanism that holds the object to be processed within the processing chamber. The mounting stand is connected to a rotational mechanism and is free to rotate, and the holder mechanism on the mounting stand is also provided with a separate, independent rotational mechanism whereby the front surface and rear surface of the object to be processed can be rotated (inverted) relative to the mounting stand. Thus the present invention provides a processing method and apparatus therefor in which the front surface and rear surface of the object to be processed can be processed under the same conditions, without having to change the atmospheric status of the object to be processed.
A processing apparatus provided with a processing chamber in which an object to be processed is processed in an atmosphere of a processing gas, said processing apparatus comprising:
A processing apparatus provided with a processing chamber in which an object to be processed is processed in an atmosphere of a processing gas, said processing apparatus comprising:
A method of processing an object to be processed in an atmosphere of a processing gas by use of a processing chamber means, the processing chamber means including a rotatable means, a mounting stand connected to the rotatable means to be rotated thereby, a pair of holders disposed uprightly on the mounting stand, each of the holders having an object holder portion, and another rotatable means provided with the holders, said processing method comprising the steps of:
Dependencies are inferred from the claim text.