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US 5,472,885 AGranted
Method of producing solar cell
AssigneeMitsubishi Denki Kabushiki Kaisha
InventorsYoshinori Matsuno, Hideo Naomoto, Satoshi Arimoto, Hiroaki Morikawa, Hajime Sasaki
Life of this patent
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Abstract
A method for producing a thin-film solar cell includes successively depositing a lower anti-reflection film having a relatively large etching rate in a prescribed etchant and an upper anti-reflection film having a relatively small etching rate in the prescribed etchant on a photosensitive surface of a semiconductor substrate; patterning the upper anti-reflection film to form an aperture; and etching the lower anti-reflection film using the patterned upper anti-reflection film as a mask.
Claims3
A method for producing solar cell, comprising:
- depositing on a solar cell body an SiN lower anti-reflection film to a first thickness effective as an anti-reflection film for the solar cell body, the SiN lower anti-reflection film having a relatively large etching rate in a prescribed etchant;
- depositing an SiO.sub.2 upper anti-refection film to a second thickness larger than a third thickness, the third thickness being effective as an anti-reflection film for the lower anti-refection film, the SiO.sub.2 anti-refection film having a relatively small etching rate in the prescribed etchant;
- patterning the SiO.sub.2 upper anti-reflection film to include an aperture exposing part of the SiN lower anti-reflection film;
- and
- simultaneously etching by means of the prescribed etchant (1) the SiN lower anti-reflection film using the patterned SiO.sub.2 upper anti-reflection film as a mask to expose part of the solar cell body and (2) the SiO.sub.2 upper anti-reflection film to reduce the second thickness to the third thickness.
2 more elements
Dependencies are inferred from the claim text.