Low phosphorous, low etch cleaner and method
AssigneeBetz Laboratories, Inc.
InventorsJiangbo Ouyang, Edward A. Rodzewich, William L. Harpel
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Abstract
Compositions and methods for cleaning and etching an aluminum surface with a low etch, low phosphate alkaline cleaner solution are disclosed. The preferred composition employs a stable combination of an alkali metal hydroxide, gluconic acid, a detergent source, an aluminum sequestrant, an oil emulsifier, a defoamer, and a hydrotrope.
Claims7
A method for cleaning and etching an aluminum surface, said method comprising applying to an aluminum surface a low aluminum etch, low phosphate-containing alkaline cleaning solution comprising, by volume percent, 5 to 50% alkali metal hydroxide and 0.5 to 10% gluconic acid, the improvement further comprising a stable combination of 0.2 to 5% of a detergent selected from the group consisting of trimethylnonanol polyethyleneglycol ether with 6 moles ethylene oxide, 0.5 to 10% of an aluminum sequestrant selected from the group consisting of poly(acrylic) acid, 0.5 to 10% of an oil emulsifier selected from the group consisting of potassium C.sub.5 to C.sub.18 alkoxy phenoxy carboxy phosphate, 0.05 to 5% of a defoamer, and 0.4 to 20% of a hydrotrope.
Dependencies are inferred from the claim text.