Removing volatile and non-volatile organic in a thick film equilibrium process and device

Abstract

There is disclosed a method for removing a volatile component from a feed or process stream comprising (1) absorbing or adsorbing the volatile component into an absorbent or adsorbent material in an equilibrium process, wherein feed is pumped through a mixture chamber of a device, wherein the device comprises the mixture chamber and a vapor chamber, wherein the mixture chamber comprises a plurality of films comprising absorbent or adsorbent materials, wherein the film is configured to have a first side communicating with the mixture chamber and a second side communicating with the vapor chamber, and (2) removing the volatile component from the absorbent or adsorbent material by applying heat to the mixture chamber and simultaneously applying a gas phase within the vapor chamber such that the volatile component is collected in a gaseous state in the vapor chamber. There is further disclosed a device for removing a volatile component from a feed comprising an enclosed two-chambered device having a mixture chamber and a vapor chamber, wherein the mixture chamber comprises a plurality of absorbent or adsorbent materials configured to have a first side communicating with the mixture chamber and a second side communicating with the vapor chamber, wherein the absorbent or adsorbent materials comprise a thick film having a thickness of from about 0.1 mm to about 5 mm thick with optional protuberances.

Dependencies are inferred from the claim text.