Topology induced plasma enhancement for etched uniformity improvement
AssigneeLam Research Corporation
InventorsRandall S. Mundt, David R. Kerr, Eric H. Lenz
Life of this patent
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Abstract
A plasma discharge electrode having a front surface with a central portion thereof including outlets for discharging reactant gas which forms a plasma and a peripheral portion substantially surrounding the outlets. The peripheral portion has at least one recess for locally enhancing a density of the plasma formed by the electrode. The recess can be formed in a replaceable insert and the electrode can be made from a single crystal of silicon.
Claims18
An electrode useful in a plasma reaction chamber, comprising:
- one or more outlets in a central portion of the electrode for discharging reactant gas outwardly of an exposed surface of the electrode;
- and
- a groove in the exposed surface, the groove being located at a peripheral portion of the electrode and extending at least partly around the central portion of the electrode, the groove being effective for topographically enhancing a local density of the plasma formed adjacent the exposed surface of the electrode.
A method of treating an article with a plasma using an electrode having a central portion and a peripheral portion surrounding the central portion, the peripheral portion including a groove in an exposed surface of the electrode and extending at least partly around the central portion of the electrode, the groove being effective for topographically enhancing a local density of the plasma formed adjacent the exposed surface of the electrode, said method comprising the steps of:
- discharging reactant gas from a central portion of the electrode;
- forming a plasma adjacent an exposed portion of the electrode, the plasma being in contact with the central and peripheral portions of the electrode;
- and
- topographically enhancing a density of the plasma at the peripheral portion of the electrode by contact of the plasma with surfaces of the electrode forming the groove.
Dependencies are inferred from the claim text.