Defect inspection apparatus of rotary type
AssigneeNikon Corporation
InventorTsuneyuki Hagiwara
Life of this patent
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Abstract
A simple signal processing system is utilized to detect defects on the surface of a substrate formed with a circuit pattern at high speed. Light flux from a light source illuminates an inspection point P on the wafer. The light flux from the inspection point P passes a Fourier transform lens and forms a Fourier transform spectrum of the circuit pattern on the inspection point P in the rear focal plane. From the Fourier transform spectrum, a Fourier transform spectrum including no defect information is eliminated by a spatial filter and thereafter the light flux is received by a photoelectric converting device. While the wafer is rotated by a turn table and shifted in a y direction, the spatial filter is rotated in synchronism with rotation of the wafer.
Claims8
A defect inspection apparatus for detecting defects on a surface of a substrate with a predetermined pattern formed thereon comprising:
- illuminating means for emitting light flux for inspection to a predetermined inspection area on the surface of said substrate;
- a Fourier transform optical device for performing Fourier transform of the light flux reflected from said substrate, an optical axis of said Fourier transform optical device intersecting a direction of the specular light of the light flux reflected from the surface of said substrate;
- a spatial filter disposed in the vicinity of a Fourier transform plane caused by said Fourier transform optical device, portions of said spatial filter coinciding with bright portions of a Fourier transform pattern of a nonerroneous reference pattern obtained by forming said circuit pattern on said substrate so as to have no defect being made to be a light-shielding portion;
- photoelectric converting means for converting light flux passed through said spatial filter photoelectrically;
- a turn table for rotating said substrate centered on a shaft parallel to the optical axis of said Fourier transform optical device;
- filter rotating means for rotating said spatial filter centered on a predetermined shaft in synchronism with rotation of said turn table;
- and
- shifting means for shifting said substrate in a plane perpendicular to the optical axis of said Fourier transform optical device,
- wherein said surface of said substrate is scanned in said predetermined inspection area spirally by rotating and shifting said substrate by said turn table and said shifting means respectively, said spatial filter is rotated by said filter rotating means in synchronism with rotation of said substrate, and defects of said predetermined pattern on said substrate are detected by a photoelectric conversion signal output from said photoelectric converting means.
A defect inspection apparatus for detecting defects on a surface of a substrate with a predetermined pattern formed thereon comprising:
- illuminating means for emitting light flux for inspection to a predetermined inspection area on the surface of said substrate;
- a Fourier transform optical device for decomposing the light flux reflected from said substrate into spatial frequency component;
- a set of photoelectric converting means for receiving the light flux of said spatial frequency components generated by said Fourier transform optical device in light receiving surfaces of a predetermined size and converting the received light flux photoelectrically;
- a turn table for rotating said substrate centered on a shaft parallel to an optical axis of said Fourier transform optical device;
- and
- shifting means for shifting said substrate in a plane perpendicular to the optical axis of said Fourier transform optical device,
- wherein said surface of said substrate is scanned in said predetermined inspection area spirally by rotating and shifting said substrate by said turn table and said shifting means respectively, and a defect of said predetermined pattern on said substrate is detected by a signal having a minimum level among photoelectric conversion signals output from said set of photoelectric converting means.
Dependencies are inferred from the claim text.