Method of manufacturing a semiconductor element
AssigneeFuji Xerox Co., Ltd.
InventorsYoshihiko Sakai, Takayuki Yamada
Life of this patent
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Abstract
A method of manufacturing a semiconductor element such as a thin film transistor or a photo diode, in which a voltage is applied to an organic insulating layer in the direction vertical to a substrate during a coating process of polyimide constituting the interlayer insulating layer formed over a semiconductor layer, a prebaking process for initial hardening which immediately follows the coating process, and a postbaking process after the pattern formation of the interlayer insulating layer.
Claims5
A method of manufacturing a semiconductor element, comprising the steps of:
- forming a semiconductor layer over a substrate;
- placing liquid organic insulating material over said semiconductor layer to form an organic insulating layer while an electric field is applied to said liquid organic insulating material in a direction vertical to said substrate;
- and
- baking said liquid organic insulating material for initial hardening immediately after said placing step while an electric field is applied to said liquid organic insulating material in the direction vertical to said substrate.
A method of manufacturing a semiconductor element, comprising the steps of:
- forming a semiconductor layer over a substrate;
- placing liquid organic insulating material over said semiconductor layer to form an organic insulating layer while an electric field is applied to said liquid organic insulating material in a direction vertical to said substrate;
- prebaking said liquid organic insulating material for initial hardening immediately after said placing step while an electric field is applied to said liquid organic insulating material in the direction vertical to said substrate;
- and
- postbaking said organic insulating layer after a pattern formation of said organic insulating layer while an electric field is applied to said organic insulating layer in the direction vertical to said substrate.
Dependencies are inferred from the claim text.