Vapor deposition method for depositing a film of fluorine-containing glass on a substrate
AssigneeAlcatel Alsthom Compagnie Generale d'Electricite
InventorsCharles Jacoboni, Brigitte Boulard, Olivier Perrot
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Abstract
A deposition method for vapor deposition of a film of fluorine-containing glass on a substrate in which said substrate is put into contact with fluxs of the vapors of the various constituents of said glass, wherein said vapor fluxs are emitted simultaneously from at least two crucibles, a first crucible containing a host bath and main metal fluorides that constitute said fluorine-containing glass, and at least one second crucible containing dopants constituted by at least one rare earth halide.
Claims8
A deposition method for vapor deposition of a film of fluorine-containing glass on a substrate, in which said glass comprises various constituents,
- wherein said substrate is put into contact with vapor flows of the various constituents of said glass to form said film of fluorine-containing glass on said substrate,
- wherein said vapor flows are emitted simultaneously from at least two crucibles, wherein said at least two crucibles comprise a first crucible and at least one additional crucible,
- wherein said first crucible contains a host bath which contains mixed therein main metal fluorides that are to constitute said fluorine-containing glass, and said at least one additional crucible contains materials constituted by at least one rare earth halide to serve as dopants in the glass.
Dependencies are inferred from the claim text.