Low-temperature oxidation at surfaces using ozone decomposition products formed by microwave discharge
AssigneeAuburn University
InventorsWilliam C. Neely, William F. Welch, Raymond F. Askew
Life of this patent
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Abstract
Decomposition of ozone in a microwave discharge cavity leads to formation of highly energetic excited states of atomic oxygen which can efficiently oxidize materials at a temperature far less than that needed for purely thermal oxidation. This technique can be applied to formation of films of silica at the surface of silicon and silicon carbide while maintaining quite moderate surface temperatures, often under 100.degree. C. The technique can be used generally in a process to oxidize materials whose oxidation requires a standard free energy change of less than about +636 kJ/mol.
Claims17
A method of forming a film of silicon dioxide at a surface of a silicon-containing solid comprising reacting at a temperature under about 300.degree. C. the silicon-containing solid with an ozone decomposition product stream formed by the decomposition of ozone at a pressure up to about 1 torr in a microwave discharge cavity, said product stream containing excited molecular oxygen and excited atomic oxygen selected from the group consisting of O(.sup.1 D), O(.sup.1 S) and combinations thereof.
A method of forming at a temperature of under 300.degree. C. a film of silicon dioxide at a surface of a silicon-containing solid comprising:
- a) leading a stream of ozone at a pressure of up to about 1 torr into a microwave discharge cavity;
- b) decomposing the ozone in said stream in said microwave discharge cavity to produce an ozone decomposition product stream Containing excited singlet molecular oxygen and excited atomic oxygen;
- c) directing the ozone decomposition product stream containing excited atomic oxygen selected from the group consisting of O(.sup.1 D), O(.sup.1 S) and combinations thereof, at the surface of said silicon-containing solid to form said film of silicon dioxide on said surface, the surface having a temperature never in excess of 300.degree. C.;
- and
- d) recovering the silicon-containing solid with the film of silicon dioxide at said surface thereof.
A method of forming a film of silicon dioxide at a surface of a silicon-containing solid comprising reacting at a temperature less than about 300.degree. C. the silicon at the surface of the silicon-containing solid with excited atomic oxygen selected from the group consisting of O(.sup.1 D), O(.sup.1 S) and combinations thereof.
A method of oxidizing materials whose oxidation requires a standard free energy change of less than about +636 kJ/mol comprising decomposing ozone in a microwave discharge cavity to produce an ozone decomposition product stream containing excited molecular oxygen and excited atomic oxygen selected from the group consisting of O(.sup.1 D), O(.sup.1 S) and combinations thereof, and reacting species in the ozone decomposition product stream with said material at a temperature under about 300.degree. C. to produce an oxide of said material on its surface.
A method of generating O(.sup.1 D) and O(.sup.1 S) comprising leading a stream of ozone at a pressure up to about 1 torr into a microwave discharge cavity and decomposing the ozone in the microwave discharge cavity with microwave radiation to produce a stream containing O(.sup.1 D) and O(.sup.1 S).
Dependencies are inferred from the claim text.