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US 5,440,122 AGranted
Surface analyzing and processing apparatus
AssigneeSeiko Instruments Inc.
InventorMasatoshi Yasutake
Life of this patent
Estimating the term…
Abstract
A surface analyzing and processing apparatus analyzes the surface of a sample by detecting secondary electrons, secondary ions, and the like coming out from the surface of the sample while exciting the surface of the sample by means of a probe of an atomic force microscope (AFM) and minutely etches the surface of the sample or deposits a thin film thereon after observing the sample with a high resolving power in the nanometer range by means of the AFM.
Claims11
Apparatus for analyzing and processing a surface of a sample, comprising:
- a vacuum chamber;
- an elastic lever having a tip and a conductive probe mounted on said tip, said lever and said probe being mounted inside said vacuum chamber at a location such that said tip is above the surface of a sample installed in said vacuum chamber;
- displacement detecting means connected to said lever for detecting displacement of said lever;
- a servo system and piezoelectric actuator connected for controlling at least one of:
- the displacement of said lever so as to keep said lever at a constant position;
- and the distance between the surface of a sample and the probe so as to keep the distance at a specified value;
- a thermostatic controlling system disposed for controlling the temperature of the surface of the sample to maintain the temperature at a specified value;
- a bias voltage supply source connected for selectively applying one of a pulsed voltage and a continuous voltage between said probe and the sample;
- current measuring means connected for detecting minute levels of current flowing out from the surface of the sample when a voltage is applied between said probe and the sample by said bias voltage supply source, said current measuring means supplying a signal representative of the detected current;
- signal integrating means coupled to said current measuring means for producing an integration signal representative of the time integral of the detected current;
- analyzing means disposed for analyzing particles scattered from the surface of the sample when a voltage is applied by said bias voltage supply source;
- and
- a plurality of nozzles extending into said vacuum chamber for introducing a selected one of a plurality of gasses into said vacuum chamber under a controlled pressure.
10 more elements
Dependencies are inferred from the claim text.