Molecular layers covalently bonded to silicon surfaces
AssigneeThe Board of Trustees of the Leland Stanford Junior University
InventorsMatthew B Linford, Christopher E. D. Chidsey
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Abstract
A method for producing a molecular layer of a selected molecular moiety (44) on a silicon surface (40) is provided in which a silicon surface (10) is etched to form a hydrogenated silicon surface and combined with a free radical-producing compound, where the free radical produced by the free radical-producing compound corresponds to the selected molecular moiety (44). The combined silicon surface and free radical-producing compound is then heated to sufficient temperature to initiate reaction between the free radical-producing compound and the hydrogenated silicon surface.
Claims39
A method for producing a silicon surface having a molecular layer of selected molecular moieties covalently bonded to the silicon surface, the method comprising the steps of:
- etching the silicon surface to eliminate any oxidized silicon from the silicon surface;
- combining the etched silicon surface with a free radical-producing compound, with free radicals produced by the free radical-producing compound corresponding to the selected molecular moieties;
- and
- initiating a reaction between the free radical-producing compound and the etched silicon surface, whereby the molecular moieties corresponding to the free radicals of the free radical-producing compound are covalently bonded to the silicon surface.
A method for producing a silicon surface having a molecular layer of selected molecular moieties covalently bonded to the silicon surface, the method comprising the steps of:
- etching the silicon surface to eliminate any oxidized silicon from the silicon surface;
- combining the etched silicon surface with an unsaturated compound having a structure such that addition of a silicon bond to the site of unsaturation yields the selected molecular moiety to be covalently bonded to the silicon surface;
- and
- initiating a reaction between the unsaturated compound and the etched silicon surface, whereby the molecular moieties at the sites of unsaturation of the unsaturated compound are covalently bonded to the silicon surface.
A composition comprising a silicon material having a surface and long chain substituted or unsubstituted alkyl groups covalently bonded to the surface of the silicon material.
A method for producing an oxidized silicon surface having a molecular layer of selected molecular moieties covalently bonded to the silicon surface, the method comprising the steps of:
- applying a reducing agent to the oxidized silicon surface to hydrogenate the silicon oxide surface;
- combining the hydrogenated silicon oxide surface with a free radical-producing compound, with free radicals produced by the free radical-producing compound corresponding to the selected molecular moieties;
- and
- initiating a reaction between the free radical-producing compound and the hydrogenated silicon oxide surface, whereby the molecular moieties corresponding to the free radicals of the free radical-producing compound are covalently bonded to the silicon oxide surface.
A method for producing a silicon oxide surface having a molecular layer of selected molecular moieties covalently bonded to the silicon oxide surface, the method comprising the steps of:
- subjecting the silicon oxide surface to a reducing agent to hydrogenate the silicon oxide surface;
- combining the hydrogentaed silicon oxide surface with an unsaturated compound having a structure such that addition of a silicon bond to the site of unsaturation yields the selected molecular moiety to be covalently bonded to the silicon oxide surface;
- and
- initiating a reaction between the unsaturated compound and the hydrogenated silicon oxide surface, whereby the molecular moieties connected to the site of unsaturation of the unsaturated compound are covalently bonded to the silicon oxide surface.
A method for producing a silicon surface having a selected polymer covalently bonded to the silicon surface, the method comprising the steps of:
- etching the silicon surface to remove oxidized silicon from the silicon surface;
- combining the silicon surface with a mixture of a free radical producing compound and an unsaturated compound having a structure corresponding to the monomers of the selected polymer;
- inducing a polymerization reaction between the silicon surface and the unsaturated compound with the free radical generating compound, to form the selected polymer covalently bonded to the silicon surface.
A method for producing a silicon oxide surface having a selected polymer covalently bonded to the silicon oxide surface, the method comprising the steps of:
- applying a reducing agent to the silicon oxide surface to hydrogenate the silicon oxide surface;
- combining the hydrogenated silicon oxide surface with a mixture of a free radical producing compound and an unsaturated compound having a structure corresponding to the monomers of the selected polymer;
- and
- inducing a polymerization reaction between the silicon oxide surface and the unsaturated compound with the free radical generating compound, to form the selected polymer covalently bonded to the silicon oxide surface.
Dependencies are inferred from the claim text.