Latent defect handling in EEPROM devices
AssigneeSunDisk Corporation
InventorsSanjay Mehrotra, Winston Lee, George Samachisa, Stephen J. Gross
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AssigneeSunDisk Corporation
InventorsSanjay Mehrotra, Winston Lee, George Samachisa, Stephen J. Gross
Estimating the term…
A memory system having a two dimensional array of EEPROM or Flash EEPROM cells is addressable by rows and columns. A word line is connected to the control gates of all the cells in each row, an erase line is connected to all the erase gates of each sector of cells, and a pair of bit lines are connected respectively to all the sources and drains of each column of cells. The memory system incorporates a word line current detector and an erase line current detector in addition to the usual bit line current detectors. The leakage current of each of the lines are measured after predetermined memory events such as program or erase operations. When a defective row or column is detected, it is electrically isolated from other columns by programming and is mapped out and replaced. Data recovery schemes include reading a defective column by a switched-memory-source-drain technique.
In an integrated circuit memory device having an array of addressable semiconductor electrically erasable and programmable (EEPROM) memory cells, the memory cell being of the type including a substrate, a source, a drain, and a control gate electrode receptive to specific voltage conditions for memory operations such as reading, programming and erasing of data in the cell, and having a floating gate capable of retaining a specific charge level corresponding to a specific memory state of the cell, said array of memory cells being organized in a two-dimensional array addressable by access lines, wherein a word line thereamong is connected to the control gates of each row of memory cells, and a pair of bit lines thereamong are respectively connected to the sources and the drains of each column of memory cells, such that the two-dimensional array is addressable by rows and columns of access lines during memory operations by specific voltage conditions thereon, said integrated circuit memory device further comprising:
In an integrated circuit memory device having an array of addressable semiconductor electrically erasable and programmable (EEPROM) memory cells, the memory cell being of the type including a substrate, a source, a drain, and a control gate electrode receptive to specific voltage conditions for memory operations such as reading, programming and erasing of data in the cell, and having a floating gate capable of retaining a specific charge level corresponding to a specific memory state of the cell, said array of memory cells being organized in a two-dimensional array addressable by access lines, wherein one type of access line being word lines connected to the control gates of each row of memory cells, and another type of access line being bit lines connected to the sources or drains of each column of memory cells, such that the two-dimensional array is addressable by rows and columns of access lines during memory operations by specific voltage conditions thereon, a method for detecting word line defects in the EEPROM memory array comprising the steps of:
In an integrated circuit memory device having an array of addressable semiconductor electrically erasable and programmable (EEPROM) memory cells, the memory cell being of the type including a substrate, a source, a drain, and a control gate electrode receptive to specific voltage conditions for memory operations such as reading, programming and erasing of data in the cell, and having a floating gate capable of retaining a specific charge level corresponding to a specific memory state of the cell, said array of memory cells being organized in a two-dimensional array addressable by access lines, wherein one type of access line being word lines connected to the control gates of each row of memory cells, and another type of access line being bit lines connected to the sources or drains of each column of memory cells, such that the two-dimensional array is addressable by rows and columns of access lines during memory operations by specific voltage conditions thereon, a method for detecting word line defects in the EEPROM memory array comprising the steps of:
In an integrated circuit memory device having an array of addressable semiconductor electrically erasable and programmable (EEPROM) memory cells, the memory cell being of the type including a substrate, a source, a drain, a control gate and an erase electrode receptive to specific voltage conditions for memory operations such as reading, programming and erasing of data in the cell, and having a floating gate capable of retaining a specific charge level corresponding to a specific memory state of the cell, said memory array being organized in a two-dimensional array and into sectors consisting of one or more rows of cells that are erasable together, the two-dimensional array being addressable by access lines, wherein one type of access line being word lines connected to the control gates of each row of memory cells, another type of access line being erase lines connected to the erase electrodes of every cells in each sector, and another type of access line being bit lines connected to the sources or drains of each column of memory cells, such that the two-dimensional array is addressable by rows and columns of access lines during memory operations by specific voltage conditions thereon, a method for detecting erase line defects in the EEPROM memory array comprising the steps of:
In an integrated circuit memory device having an array of addressable semiconductor electrically erasable and programmable (EEPROM) memory cells, the memory cell being of the type including a substrate, a source, a drain, a control gate and an erase electrode receptive to specific voltage conditions for memory operations such as reading, programming and erasing of data in the cell, and having a floating gate capable of retaining a specific charge level corresponding to a specific memory state of the cell, said memory array being organized in a two-dimensional array and into sectors consisting of one or more rows of cells that are erasable together, the two-dimensional array being addressable by access lines, wherein one type of access line being word lines connected to the control gates of each row of memory cells, another type of access line being erase lines connected to the erase electrodes of every cells in each sector, and another type of access line being bit lines connected to the sources or drains of each column of memory cells, such that the two-dimensional array is addressable by rows and columns of access lines during memory operations by specific voltage conditions thereon, a method for detecting defects in a specified type of access line in the EEPROM memory array comprising the steps of:
In an integrated circuit memory device having an array of addressable semiconductor electrically erasable and programmable (EEPROM) memory cells, the memory cell being of the type including a substrate, a source, a drain, a control gate and an erase electrode receptive to specific voltage conditions for memory operations such as reading, programming and erasing of data in the cell, and having a floating gate capable of retaining a specific charge level corresponding to a specific memory state of the cell, said memory array being organized in a two-dimensional array and into sectors consisting of one or more rows of cells that are erasable together, the two-dimensional array being addressable by access lines, wherein one type of access line being word lines connected to the control gates of each row of memory cells, another type of access line being erase lines connected to the erase electrodes of every cells in each sector, and another type of access line being bit lines connected to the sources or drains of each column of memory cells, such that the two-dimensional array is addressable by rows and columns of access lines during memory operations by specific voltage conditions thereon, a method for detecting column defects due to a bit line shorted to another type of access line in the EEPROM memory array, comprising the steps of:
In an integrated circuit memory device having an array of addressable semiconductor electrically erasable and programmable (EEPROM) memory cells, the memory cell being of the type including a substrate, a source, a drain, a control gate and an erase electrode receptive to specific voltage conditions for memory operations such as reading, programming and erasing of data in the cell, and having a floating gate capable of retaining a specific charge level corresponding to a specific memory state of the cell, said memory array being organized in a two-dimensional array and into sectors consisting of one or more rows of cells that are erasable together, the two-dimensional array being addressable by access lines, wherein one type of access line being word lines connected to the control gates of each row of memory cells, another type of access line being erase lines connected to the erase electrodes of every cells in each sector, and another type of access line being bit lines connected to the sources or drains of each column of memory cells, such that the two-dimensional array is addressable by rows and columns of access lines during memory operations by specific voltage conditions thereon, a method for detecting column defects due to bit line short circuit in the EEPROM memory array, comprising the steps of:
In an integrated circuit memory device having an array of addressable semiconductor electrically erasable and programmable (EEPROM) memory cells, the memory cell being of the type including a substrate, a source, a drain, a control gate and an erase electrode receptive to specific voltage conditions for memory operations such as reading, programming and erasing of data in the cell, and having a floating gate capable of retaining a specific charge level corresponding to a specific memory state of the cell, said memory array being organized in a two-dimensional array and into sectors consisting of one or more rows of cells that are erasable together, the two-dimensional array being addressable by access lines, wherein one type of access line being word lines connected to the control gates of each row of memory cells, another type of access line being erase lines connected to the erase electrodes of every cells in each sector, and another type of access line being bit lines connected to the sources or drains of each column of memory cells, such that the two-dimensional array is addressable by rows and columns of access lines during memory operations by specific voltage conditions thereon, a method for detecting column defects due to bit line short circuit in the EEPROM memory array, comprising the steps of:
In an integrated circuit memory device having an array of addressable semiconductor electrically erasable and programmable (EEPROM) memory cells, the memory cell being of the type including a substrate, a source, a drain, a control gate and an erase electrode receptive to specific voltage conditions for memory operations such as reading, programming and erasing of data in the cell, and having a floating gate capable of retaining a specific charge level corresponding to a specific memory state of the cell, said memory array being organized in a two-dimensional array and into sectors consisting of one or more rows of cells that are erasable together, the two-dimensional array being addressable by access lines, wherein one type of access line being word lines connected to the control gates of each row of memory cells, another type of access line being erase lines connected to the erase electrodes of every cells in each sector, and another type of access line being bit lines connected to the sources or drains of each column of memory cells, such that the two-dimensional array is addressable by rows and columns of access lines during memory operations by specific voltage conditions thereon, a method for detecting column defects due to bit line short circuit in the EEPROM memory array, comprising the steps of:
In an integrated circuit memory device having an array of addressable semiconductor electrically erasable and programmable (EEPROM) memory cells, the memory cell being of the type including a substrate, a source, a drain, a control gate and an erase electrode receptive to specific voltage conditions for memory operations such as reading, programming and erasing of data in the cell, and having a floating gate capable of retaining a specific charge level corresponding to a specific memory state of the cell, said memory array being organized in a two-dimensional array and into sectors consisting of one or more rows of cells that are erasable together, the two-dimensional array being addressable by access lines, wherein one type of access line being word lines connected to the control gates of each row of memory cells, another type of access line being erase lines connected to the erase electrodes of every cells in each sector, and another type of access line being bit lines connected to the sources or drains of each column of memory cells, such that the two-dimensional array is addressable by rows and columns of access lines during memory operations by specific voltage conditions thereon, a method for handling defects in the EEPROM memory array comprising providing a memory controller for controlling memory operations of said memory device, said memory controller performing the steps of:
Dependencies are inferred from the claim text.