Loading patent…
AssigneeU.S. Philips Corporation
InventorsJan Haisma, Martinus Verheijen, Johannes T. Schrama
Estimating the term…
A description is given of a method and a device (1) for providing (replicating) a patterned resyntetic resin relief (37) on the surface (25) of a glass substrate (27). For this purpose, a UV-curable acrylate lacquer (33) is applied to the surface (25), after which a transparent mould (3) having a relief (13) is rolled-off over the surface (25). By means of a UV light source (17) and an elliptic mirror (21), the lacquer is cured at the location of the focal line (23), thereby forming said relief (37). The relief (13) of the mould (3) is replicated on the glass substrate (27). The method described enables a relief of small dimensions (10.times.10 .mu.m) to be seamlessly provided on a large fiat surface (1.times.1 m), without being hindered by large release forces.
A method of providing a patterned relief of cured photoresist on a flat substrate surface, the substrate surface being provided with a layer of a UV-light curable liquid photoresist, after which the photoresist is brought into contact with a UV light-transparent mould having a relief which is complementary to the patterned relief to be provided and which is subsequently cured by exposure to a UV light source, thereby forming the patterned relief, after which the mould of the cured relief is removed, characterized in that a hollow circular-cylindrical mould which rotates about its cylinder axis is used as the mould, the outside of the cylinder surface being provided with the relief and the cylinder axis extending parallel to the substrate surface, the interior of the mould being provided with an elliptic mirror having a first and a second focal line, said focal lines extending parallel to the substrate surface and the first focal line coincided with the longitudinal axis of the UV light source, and the second focal line coinciding with a tangent of the mould to the substrate surface, so that the photoresist is cured at the location of the second focal line, thereby forming a part of the patterned relief, while the substrate surface is kept in non-slip contact with the rotating mould.
A device for providing a patterned relief of cured photoresist on a flat surface of a substrate, comprising a hollow circle-cylindrical, UV-light-transparent mould which can be rotated about its cylinder axis, the outside of the cylinder surface being provided with a relief which is complementary to the patterned relief to be provided, the interior of the mould being provided with at least one UV light source as well as means for focusing the UV light to a line extending parallel to the cylinder axis and coinciding with the relief, and the device also comprising a substrate carrier having means for securing the substrate and the closely contacting, at least during exposure, the substrate surface and the rotatable mould, in such a manner that the substrate surface and the mould can be rolled off with respect to each other.
Dependencies are inferred from the claim text.