Scanning systems for high resolution e-beam and X-ray lithography

An electron-beam lithography apparatus, comprising:

• (a) an electron source comprising a mask, a photocathode, or both a mask and a photocathode, for generating a patterned electron beam;
• (b) means for placing a substrate with an electron-sensitive resist layer in a position to receive at least a portion of the patterned electron beam;
• (c) a conductive plate with a slit, said plate being intermediate said electron source and said substrate-placing means, whereby electrons of the patterned electron beam pass through the slit but not through the remainder of the plate;
• (d) means for providing an electric field between said electron source and said conductive plate to accelerate the electrons, wherein the conductive plate causes the electric field between said conductive plate and said substrate-placing means to be substantially zero;
• (e) means for providing a magnetic field between said electron source and said substrate-placing means, to focus the electrons on the substrate;
• and
• (f) means for synchronously scanning the mask or the photocathode and said substrate-placing means at the same velocity relative to the slit and to said electron source, and at zero velocity relative to each other, whereby substantially all of the pattern of the patterned electron beam is imaged on the substrate without substantial change in size.