Plasma CVD apparatus including rotating magnetic field generation means

A plasma CVD apparatus comprising a reaction vessel, means for feeding a reactant gas to the reaction vessel and discharging said reactant gas from said vessel, discharging electrodes disposed in the reaction vessel, and a source for supplying power for glow discharge to the discharging electrodes thereby forming an amorphous (noncrystalline) thin film on a surface of a substrate held within the reaction vessel, wherein said substrate surface perpendicularly intersects an electric field formed between the discharging electrodes, said apparatus further comprising two solenoid coils at least partially overlapping each other, each coil having an axis so disposed that said coil axes perpendicularly intersect each other and perpendicularly intersect the electric field between the discharging electrodes, and an AC source for supplying electric currents to the solenoid coils for magnetic field generation, said electric currents having a 90.degree. phase difference, whereby a rotating resultant magnetic field is applied which rotates at a constant angular velocity.