Abrasive cloth dresser

Abstract

An abrasive cloth dresser which can efficiently remove reaction products soaked into abrasive cloths for polishing semiconductor wafers etc. without scattering the reaction products. The abrasive cloth dresser includes a rotating hollow arm shaft 7, a high-pressure pure water jetting head 8 provided at a distal end of the hollow arm shaft, and a brush hood 11 provided at a distal end of the high-pressure pure water jetting head 8 and having a brush 16 planted thereto. The high-pressure pure water jetting head 8 includes a jet nozzle 83 through which high-pressure pure water is jetted for impacting reaction products soaked into a piece of abrasive cloth 3 to come out for removal. The brush 16 is elliptical in shape, and has a planted bristle density which is lower in a brush left-hand portion 161 near the high-pressure pure water injection center IC, but higher in a brush central portion 162 and a brush right-hand portion 163. Accordingly, the spent pure water and the reaction products are caused to reside in a pure water pool area WP, following which the pure water having lost energy and the reaction products are discharged through the brush left-hand portion 161 without scattering to the surroundings.

Dependencies are inferred from the claim text.