Stripping with aqueous composition containing hydroxylamine and an alkanolamine
AssigneeAshland Inc.
InventorIrl E. Ward
Life of this patent
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Abstract
An aqueous stripping composition comprising a mixture of about 55% to 70% by weight of monoethanolamine, about 22.5 to 15% by weight of hydroxylamine and water. The stripping composition is effective to strip photoresists, residues from plasma process generated, organic, metal-organic materials, inorganic salts, oxides, hydroxides or complexes in combination with or exclusive of organic photoresist films at low temperatures without redepositing any substantial amount of metal ions.
Claims5
A process for removing an organic coating from a coated substrate comprising applying to said coated substrate a stripping effective amount of the stripping composition consisting essentially of a mixture of:
- a) about 55% to about 70% by weight of monoethanolamine;
- b) about 22.5 to about 15% by weight of hydroxylamine, and
- c) the balance being water, permitting said stripping composition to reside on said coated substrate for a stripping effective period of time and removing the coating from said substrate.
A process for removing an organic coating from a coated substrate comprising applying to said coated substrate a stripping effective amount of the stripping composition consisting of about 62% by weight of monoethanolamine, about 19% by weight of hydroxylamine, and the balance being water, permitting said stripping composition to reside on said coated substrate for a stripping effective period of time and removing the coating from said substrate.
Dependencies are inferred from the claim text.