Back to results
US 5,415,191 AGranted
Arrangement for cleaning semiconductor wafers using mixer
AssigneeKabushiki Kaisha Toshiba
InventorsNoriyoshi Mashimo, Katsuya Okumura
Life of this patent
Estimating the term…
Abstract
For cleaning semiconductor wafers in a cleaning vessel by supplying a cleaning fluid through a supply line thereto, a mixer is provided. Deionized water is supplied to the mixer through a deionized water supply line, and a cleaning gas is supplied thereto from a gas reservoir to produce the cleaning fluid. After treating the semiconductor wafers with the cleaning fluid, the deionized water is supplied to the cleaning vessel to rinse them.
Claims8
An arrangement for cleaning semiconductor wafers comprising:
- a cleaning vessel for cleaning a plurality of semiconductor wafers;
- a supply line for alternately supplying a cleaning fluid and deionized water to said cleaning vessel;
- and
- a mixer for mixing a cleaning gas with said deionized water coupled to said supply line, said mixer including gas permeable hollow yarns disposed in a case, said case having an inlet port for said deionized water coupled to a deionized water supply line, an outlet port for said cleaning fluid coupled to said supply line, and a gas inlet port coupled to a cleaning gas supply line.
1 more element
Dependencies are inferred from the claim text.