Electron beam apparatus
AssigneeHitachi, Ltd.
InventorsTadashi Otaka, Akimitsu Okura, Hiroshi Iwamoto, Hideo Todokoro, Tsutomu Komoda, Issei Tobita
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AssigneeHitachi, Ltd.
InventorsTadashi Otaka, Akimitsu Okura, Hiroshi Iwamoto, Hideo Todokoro, Tsutomu Komoda, Issei Tobita
Estimating the term…
An electron beam apparatus comprises an electron beam source, a unit for irradiating an electron beam on a specimen, a detector for secondary electrons, an electrode for generating an electric field sufficient to draw out secondary electrons in a recess in the specimen from the recess, and a unit for generating a magnetic field for focusing secondary electrons drawn out of the recess. With this construction, the secondary electrons drawn out of the recess by the electric field reach the detector without being attracted by the electrode. By adopting this construction, a contact hole of high aspect ratio formed in a semiconductor device and having a small diameter and a large depth can be observed.
A charged particle beam apparatus for observing a specimen having a recess in its surface, comprising:
An electron beam apparatus for observing a specimen having recesses, comprising:
An electron beam apparatus for observing a specimen having recesses, comprising:
An electron beam apparatus for observing a specimen having recesses, comprising:
A charged particle beam apparatus for observing a specimen having recesses, comprising:
An electron beam apparatus for observing a specimen, comprising:
A scanning electron microscope for scanning an electron beam spot at an observation area on a specimen and fetching a signal generated secondarily from said observation area to produce an observation image, comprising:
An observation method in a scanning electron microscope for scanning an electron beam spot at an observation area on a specimen and fetching a signal generated secondarily from said observation area to produce an observation image, comprising irradiating a first electron beam at a first imaging magnification for a predetermined period of time on an area including at least a predetermined observation area and thereafter irradiating a second electron beam at second imaging magnification larger than the first imaging magnification on said predetermined observation area to perform image observation.
An observation method in a scanning electron microscope for scanning an electron beam spot at an observation area on a specimen and fetching a signal generated secondarily from said observation area to produce an observation image, comprising irradiating a first electron beam at a first imaging magnification for a predetermined period of time on an area including at least a predetermined observation area and thereafter irradiating a second electron beam at a second imaging magnification smaller than the first imaging magnification on said predetermined observation area to perform image observation.
An electron beam apparatus for observing a specimen having a recess in its surface, comprising:
Dependencies are inferred from the claim text.