Method of measuring orientation flat width of single crystal ingot
AssigneeShin-Etsu Handotai Co., Ltd.
InventorsYasuhiro Ishii, Yoshihiro Hirano
Life of this patent
Estimating the term…
Loading patent…
AssigneeShin-Etsu Handotai Co., Ltd.
InventorsYasuhiro Ishii, Yoshihiro Hirano
Estimating the term…
Disclosed is a method of measuring the OF width of a cylindrical single crystal ingot using an optical non-contact type displacement measuring device. This method can avoid the labor and measurement errors as generally seen in the conventional manual method and provide an easy and precise measurement. Further, the method can be automated if necessary. This method comprises the steps of detecting the boundary points between the OF and the round surface of the single crystal ingot from the displacement to be obtained by scanning the sensor while detecting the distance between the sensor and the ingot surface including the OF, and calculating the OF width C from the scanning distance A of the sensor from the first boundary point detection position to the second boundary point detection position and the difference B between the first distance 1.sub.1 from the first boundary point to the sensor and the second distance 1.sub.2 from the sensor to the second boundary point.
A method of measuring the orientation flat width of a single crystal ingot by the use of an apparatus including an optical non-contact type displacement measuring device having a sensor, means for fixing the orientation fiat of the single crystal ingot facing to the sensor, means for scanning the sensor in the direction normal to the major axis of the single crystal ingot and means for measuring the scanning distance, comprising the steps of:
Dependencies are inferred from the claim text.