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US 5,401,872 AGranted
Treatment of vent gas to remove hydrogen chloride
AssigneeHemlock Semiconductor Corporation
InventorsRichard A. Burgie, Owen A. Heng, Tod E. Lange
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Abstract
A process for recovering chlorine present in a gaseous vent stream. The process comprises contacting a gaseous vent gas comprising hydrogen chloride and a hydrosilane with a chlorination catalyst to form a more chlorinated silane. The chlorination of the hydrosilane captures the chlorine of the hydrogen chloride as a substituent of the resulting chlorosilane and provides for a readily condensable chlorosilane.
Claims12
A process for recovering chloride ion present in a gaseous vent stream as hydrogen chloride, the process comprising:
- (A) contacting a vent gas comprising hydrogen chloride and silanes described by formula
- H.sub.a SiCl.sub.4-a,
- where a=1 to 4, with a chlorination catalyst at a temperature within a range of about 30.degree. C. to 400.degree. C. thereby effecting substituting of silicon-bonded hydrogen with chlorine to form a more chlorinated silane, and
- (B) recovering the more chlorinated silane.
1 more element
Dependencies are inferred from the claim text.