Coating composition for glass
AssigneeElf Atochem North America, Inc.
InventorsDavid A. Russo, Ryan R. Dirkx, Glenn P. Florczak
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Abstract
A composition for coating glass by chemical-vapor deposition comprises a mixture of a tin oxide precursor monobutyltin trichloride, a silicon dioxide precursor tetraethylorthosilicate, and an accelerant such as triethyl phosphite; the composition is gaseous below 200.degree. C., and permits coating glass having a temperature from 450.degree. to 650.degree. C. at deposition rates higher than 350 .ANG./sec. The layer of material deposited can be combined with other layers to produce an article with specific properties such as controlled emissivity, refractive index, abrasion resistance, or appearance.
Claims27
A gaseous composition at a temperature below about 200.degree. C. at atmospheric pressure, adapted to deposit at least a first layer of tin oxide and silicon oxide onto glass at a rate of deposition greater than about 350 .ANG./sec. wherein the composition comprises a precursor of tin oxide, a precursor of silicon oxide of formula R.sub.m O.sub.n Si.sub.p, where m is from 3 to 8, n is from 1 to 4, p is from 1 to 4, and R is independently chosen from hydrogen and acyl, straight, cyclic, or branched-chain alkyl and substituted alkyl or alkenyl of from one to about six carbons, and phenyl or substituted phenyl, an accelerant selected from the group consisting of organic phosphites, organic borates and water, and mixtures thereof, and a source of oxygen.
A gaseous composition at a temperature below about 200.degree. C. at atmospheric pressure, adapted to deposit at least a first amphorous layer comprising tin oxide and silicon oxide onto glass at a rate of deposition greater than about 400 .ANG./sec., the layer having a controlled index of refraction, wherein the composition comprises a tin oxide precursor, a silicon oxide precursor of formula R.sub.m O.sub.n Si.sub.p, where m is from 3 to 8, n is from 1 to 4, p is from 1 to 4, and R is independently chosen from hydrogen and acyl, straight, cyclic, or branched-chain alkyl and substituted alkyl or alkenyl of from one to about six carbons, and phenyl or substituted phenyl, and at least one accelerant chosen from the group consisting of boron and phosphorous esters and water.
A gaseous composition at a temperature below about 200.degree. C. and at atmospheric pressure, adapted to deposit at least a first layer comprising amorphous tin oxide and silicon oxide onto glass at a temperature of front about 450.degree. to 650.degree. C. at a rate of deposition greater than about 350 .ANG./sec., wherein the composition comprises:
- a tin oxide precursor of formula R.sub.n SnX.sub.4-n, where R is a straight, cyclic, or branched-chain alkyl, or alkenyl of from one to about six carbons;
- phenyl, substituted phenyl, or R'CH.sub.2 CH.sub.2 --, where R' is MeO.sub.2 C--, EtO.sub.2 C--, CH.sub.3 CO--, or HO.sub.2 C--;
- X is selected from the group consisting of halogen, acetate;, perfluoroacetate, and their mixtures;
- and where n is 0, 1, or2;
- a silicon oxide precursor of formula R.sub.m O.sub.n Si.sub.p, where m is from 3 to 8, n is from 1 to 4, p is from 1 to 4, and R is independently chosen from hydrogen and acyl, straight, cyclic, or branched-chain alkyl and substituted alkyl or alkenyl of from one to about six carbons, and phenyl or substituted phenyl;
- one or more accelerants selected from the group consisting of water and organic phosphites and organic borates of formula (R"O).sub.3 P and (R"O).sub.3 B where R" is independently chosen from straight, cyclic or branched-chain alkyl or alkenyl of from one to about six carbons;
- phenyl, substituted pheny, or R'" CH.sub.2 CH.sub.2 --, where R'" is MeO.sub.2 C--, EtO.sub.2 C--, CH.sub.3 CO--, or HOOC--;
- and
- a source of oxygen.
Dependencies are inferred from the claim text.