Color filter and the manufacturing method therefor

A method for forming a color filter comprising the steps of:

• (a) forming a porous transparent activated film layer by applying a colloid selected from the group consisting of .chi.-Al.sub.2 O.sub.3 .multidot.nH.sub.2 O, .gamma.-Al.sub.2 O.sub.3 .multidot.nH.sub.2 O, .eta.-Al.sub.2 O.sub.3 .multidot.nH.sub.2 O, .delta.-Al.sub.2 O.sub.3 .multidot.nH.sub.2 O, SiO.sub.2 .multidot.nH.sub.2 O and a mixture thereof on a transparent substrate and baking said colloid;
• (b) permeating a dye into said activated film layer to form a color pattern;
• (c) bringing a solution containing a catalyst into contact with said activated film layer so that said activated film layer adsorbs the solution containing the catalyst;
• (d) performing an electroless plating to form a thin metal film layer on said activated film layer;
• (e) forming a resist layer at a portion, of said thin metal film layer, which requires the formation of a black mask;
• (f) etching said thin metal film layer to form a thin metal film pattern;
• and
• (g) removing said resist layer.

A method for forming a color filter comprising the steps of:

• (a) forming a porous transparent activated film layer by applying a colloid selected from the group consisting of .chi.-Al.sub.2 O.sub.3 .multidot.nH.sub.2 O, .gamma.-Al.sub.2 O.sub.3 .multidot.nH.sub.2 O, .eta.-Al.sub.2 O.sub.3 .multidot.nH.sub.2 O, .delta.-Al.sub.2 O.sub.3 .multidot.nH.sub.2 O, SiO.sub.2 .multidot.nH.sub.2 O and a mixture thereof on a transparent substrate and baking said colloid;
• (b) permeating a dye into said activated film layer to form a color pattern;
• (c) forming a resist layer at a portion, of said activated film layer, which does not require the formation of a black mask;
• (d) bringing a solution containing a catalyst into contact with said activated film layer so that said activated film layer adsorbs the solution containing the catalyst;
• (e) removing said resist layer;
• and
• (f) performing an electroless plating to form a thin metal pattern as a black mask.

A method for forming a color filter comprising the steps of:

• (a) forming a porous transparent activated film layer by applying a colloid selected from the group consisting of .chi.-Al.sub.2 O.sub.3 .multidot.nH.sub.2 O, .gamma.-Al.sub.2 O.sub.3 .multidot.nH.sub.2 O, .eta.-Al.sub.2 O.sub.3 .multidot.nH.sub.2 O, .delta.-Al.sub.2 O.sub.3 .multidot.nH.sub.2 O, SiO.sub.2 .multidot.nH.sub.2 O and a mixture thereof on a transparent substrate and baking said colloid, wherein said activated film layer is an aluminum or silicon oxide film layer having plural pores whose diameters are approximately from a few nm to 100 nm;
• (b) permeating a dye into said activated film layer to form a color pattern;
• (c) forming a resist layer at a portion, of said activated film layer, which does not require the formation of a black mask;
• (d) bringing a solution containing a catalyst into contact with said activated film layer so that said activated film layer adsorbs the solution containing the catalyst;
• (e) performing an electroless plating to form a thin metal pattern, as a black mask, reverse to that of a resist layer;
• and
• (f) removing said resist layer.

A method for forming a color filter comprising the steps of:

• (a) forming a porous transparent activated film layer by applying a colloid selected from the group consisting of .chi.-Al.sub.2 O.sub.3 .multidot.nH.sub.2 O, .gamma.-Al.sub.2 O.sub.3 .multidot.nH.sub.2 O, .eta.-Al.sub.2 O.sub.3 .multidot.nH.sub.2 O, .delta.-Al.sub.2 O.sub.3 nH.sub.2 O, SiO.sub.2 .multidot.nH.sub.2 O and a mixture thereof on a transparent substrate and baking said colloid, wherein said activated film layer is an aluminum or silicon oxide film layer having plural pores whose diameters are approximately from a few nm to 100 nm;
• (b) permeating a dye into said activated film layer to form a color pattern;
• (c) bringing a solution containing a catalyst into contact with said activated film layer so that said activated film layer adsorbs the solution containing the catalyst;
• (d) performing an electroless plating to form a thin metal film layer on said activated film layer;
• (e) forming a resist layer at a portion, of said thin metal film layer, which requires the formation of a black mask;
• (f) etching said thin metal film layer to form a thin metal film pattern;
• and
• (g) removing said resist layer.

A method for forming a color filter comprising the steps of:

• (a) forming a porous transparent activated film layer by applying a colloid selected from the group consisting of .chi.-Al.sub.2 O.sub.3 .multidot.nH.sub.2 O, .gamma.-Al.sub.2 O.sub.3 .multidot.nH.sub.2 O, .eta.-Al.sub.2 O.sub.3 .multidot.nH.sub.2 O, .delta.-Al.sub.2 O.sub.3 .multidot.nH.sub.2 O, SiO.sub.2 .multidot.nH.sub.2 O and a mixture thereof on a transparent substrate and baking said colloid, wherein said activated film layer is an aluminum or silicon oxide film layer having plural pores whose diameters are approximately from a few nm to 100 nm;
• (b) permeating a dye into said activated film layer to form a color pattern;
• (c) forming a resist layer at a portion, of said activated film layer, which does not require the formation of a black mask;
• (d) bringing a solution containing a catalyst into contact with said activated film layer so that said activated film layer adsorbs the solution containing the catalyst;
• (e) removing said resist layer;
• and
• (f) performing an electroless plating to form a thin metal pattern as a black mask.